Applied Materia 300mm CenturaAP

Listing description

AMAT 300mm(12") CenturaAP HDPCVD UltimaX / 2 Chambers.

1. Manufacture: Applied Materials
2. Product: AMAT CVD 300mm CenturaAP HDPCVD UltimaX
3. Wafer Size: 300mm ( 12" )
Vintage: 2005. 05.01
Factory Interface (FI) version : 5.3
Number of Load-ports : 3EA
FI Robot Type: Kawasaki w/Edge Grip & Pre-Aligner (Single Axis)
Mainframe Type: 300mm CenturaAP Mainframe
Vacuum Robot Type: VHP w/ 2 Ceramic Blades
LLKA: SWLL
LLKB: SWLL
Chamber Configuration
A: Ultima X HDP-CVD
B: Ultima X HDP-CVD
C: Blank
D: Blank
Process Chambers:
Ch#A/B: Ultima X HDP-CVD
Process: USG STI & IMD, PSVN
Gas Ring & Nozzle Type: 36 Ports & 1.76” ALN Nozzles
Cathode Type: 300mm Dual HE ESC
RPS Type: MKS Astron RPS
Turbo Pump Type: STP-XH3203P
Gate Valve Type: NorCal
RF Generator: TOP/SIDE - MKS ENI Spectrum (2Mhz, 11KW)
BIAS MKS ENI Spectrum (13.56Mhz, 11KW)
RF Match Box: Top/Side – Local Match, Bias – AE AZX72 Auto tune match Box
IHC Type: 20/20Torr Dual IHC
WTM Type: Wafer Temperature Monitor 4 Channel

Gas Pallet Configuration:
12 Stick Gas Pallets
1. N2 purge
2. O2: 400sccm
3. NF3: 400sccm
4. He: 600sccm
5. SIH4: 400sccm
6. H2: 1000sccm
7. AR:1000sccm
8. SiH4: 50sccm
9. He: 600sccm
10. NF3: 400sccm
11. NF3: 3000sccm
12. Ar: 3000sccm
13. N2 purge
Gas Panel Feed: Bottom
Exhaust: Bottom
MFCs: Unit 8565C Multiflow
Valve Type: Veriflo
Filter Type: Millipore
Controller Type: DeviceNet

Heat Exchanger
SMC Heat Exchanger: HOT/COLD LOOP - INR-498-011C X 2EA
Transfer Pump: Alcatel A100L iPUP X 1EA
Primary AC Rack: X 1EA
Facilities UPS Interface
Power Requirements: 200/208VAC, 3-Phase, 400A, 4-Wire, Frequency 50/60Hz

This equipment is located in KR