Karl Suss MA-56 MA56 Mask

Listing description

Karl Suss MA-56 MA56 Mask Aligner Exposure System

Karl Suss MA-56 Mask Aligner System

System includes:
Karl Suss MA-56 Mask Aligner
Karl Suss CIC-500 Power Supply
StockerYale Imagelite Model 20
Light Source
Objectives
(2) Leitz PLAN L25x/0.40
(2) Leitz NPL 10x/0.20
(2) Leitz 3,5:1 0,08
Alcatel Vacuum Pump
Features:

KSM Split field microscope
Motorized XYZ Stage
Specifications:
System capable of 3" to 5"
Cassette to Cassette
350 W Lamp
UV-400 Exposure optics
365 - 405nm Wavelength
Max substrate size 4" x 4"
Objective distance adjustable 24 - 100mm
208V / 1 phase / 20 amp
5 bar (80 psi) CDA
2 bar (35 psi) N2
The Karl Suss MA 56 is a mask alignment and exposure
system which offers unsurpassed, highly economical mass
production capabilities for cassette to cassette handling of
wafers up to 4" wafers and 5" masks, although smaller
wafers and chips may be mounted to a 4" carrier wafer and
processed.
The light sources are a 30 W Deuterium lamp
with 310 nm wavelength and a 350 W mercury arc lamp with
365 nm wavelength.
The vacuum contact mode is available.

The microscope has dual alignment objectives and
split-field viewing.
The mask and microscope have
motorized motion in x and y, and they may be moved
together or independently over the stationary wafer.

Condition:
Very nice, very clean condition with very little wear

Functionality:
Fully functional (will require air and nitrogen hookups)

This equipment is located in US