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OXFORD PLASMALAB 100 PECVD consisting of:
- Model: Plasmalab 100 PECVD
- Process: SiO2 and SiN deposition
- Max Wafer Size Capable: 8/200mm
- Single wafer process up to 8-inch wafer
- Load Locked Chamber
- 600W RF Generator
- Substrate Electrode: 205mm
- Shower Head Gas Inlet Optimised for PECVD
- 400° C Substrate Table
- System Computer
- System Chiller
- Alcatel 2033 Vacuum Pump (Loadlock Pump)
- Alcatel 2033 Vacuum Pump & RSV301B Blower (Chamber Pump)
- Oxford PC2000 Software
- Windows XP Operating Software (OS)
- Operations Manuals for Plasmalab 100 PECVD
- Manufactured in 2008!
- Serial number: 94-814892
- CE Certified
- Gas cabinet setup with 7 gases as follows:
1. CF4/O2
500sccm
MKS 1179
viton seals
2. N2
2SLM
MKS 1179
viton seals
3. N2O
1SLM
MKS 1179
viton seals
4. HE
2SLM
MKS 1179
viton seals
5. SiH4
50sccm
MKS 1479
metal seals
6. PH3/AR
50sccm
MKS 1479
metal seals
7. B2H6/AR
50sccm
MKS
1479 metal seals
This equipment is located in US
Manufacturer | Oxford |
Model | Plasmalab 100 P |
Year | - |
Country | USA |
Condition | Good |
Main category | PCB and SMT equipment |
Subcategory | Other Semi Tools |
ID | P50908056 |
Client type | Machinery dealer |
On Kitmondo since | 2011 |
Number of listings | 0 |
Country | USA |
Last activity | Aug. 25, 2023 |