Tepla 300 Plasma Ashe

Listing description

TEPLA 300 PLASMA ASHER consisting of:

- Model: 300 SemiAuto
- Manual Wafer Load Plasma Asher
- Used for Wafer Cleaning and Descum
- Can Process up to 150mm Wafers
- Faraday Cage
- Computer PC Controlled
- Plasma Chamber: Quartz
- Plasma Chamber Dims: 245mm Diameter, 380mm Depth
- Plasma Generation: 2.45 GHz Max / 1.000 Watt Variable
- Gas Lines: N2 Gas Input and 2 Process Gas Inputs
- All MFCs Rebuilt and Calibrated
- Leybold D65BCS Fomblin Prepped Vacuum Pump (Professionally Rebuilt)
- Power Requirement: 230V, 50/60hz
- Operators Manual for Tepla 300
- System Refurbishment Includes: All Consummables (O-Rings, Seals) Replaced, MFCs Rebuilt and Calibrated, Quartz Chamber Cleaned, Vacuum Pump Rebuilt, and more.
- Excellent Condition Guaranteed!

This equipment is located in US