Aspen 2 ICP

Dernière disponibilité: Oct. 5, 2020

Description de l'offre

Aspen 2 Dual ICP Maker: Mattson
Numéro de série: 925
Application: Asher / Stripper
Modèle: Aspen 2 ICP
Millésime: 2001
Taille de la plaquette: 6 "ou 8" (configuré comme demande du client)
 Configuration des détails:
1. Plate-forme de cassette: SMIF
2. Chambre de refroidissement: installé, nouveau type
3. Porte à fente: nouveau type
4. Robot Assy. : Standard, Nouveau type
5. Porte cassette: 18 "
6. Générateur RF: Adtek X 4
7. Bloc de chaleur / refroidissement: appareil de chauffage, nouveau type avec motif de rainure ciculaire
8. Boîte d'adaptation RF: Trazar AMU 10D X 4
9. Gaz: 3 gaz avec STEC MFC
10. Boîte à gaz: nouveau type

Veuillez noter que cette description a pu être traduite automatiquement.

Dernière disponibilité: Oct. 5, 2020

Informations de l'offre

Fabricant Mattson
Modèle Aspen 2 ICP
Année 2001
Pays Taïwan Taïwan
Condition Bonne
Catégorie PCB et semi-conducteur
Sous-catégorie Autres semi-outils
ID P91021038

Dernière disponibilité: Oct. 5, 2020

A propos du vendeur

Type de client Marchand
Sur Kitmondo depuis 2013
Nombre d'offres 3
Pays Taïwan Taïwan
Employés 11 - 50
Fondée en 9
Description de l'entreprise

The company has been doing in Inductively Coupled Plasma (ICP)technology and used Mattson Aspen 2 system refurbish for several years. Our company has got the advanced plasma technology in the wor… voir plus

The company has been doing in Inductively Coupled Plasma (ICP)technology and used Mattson Aspen 2 system refurbish for several years. Our company has got the advanced plasma technology in the world. We are specialized in semiconductor and LED process technology & equipment. We focus our clients on the fields of LED, Semiconductors (Front end and Back end), Printed circuit boards (PCB), etc, and provide the key technologies to the rapidly developing semiconductor and LED industry. In order to achieve our goal to keep in the lead of advanced plasma technologies and have a sustainable development, we develop new techniques continuously to improve the performance for our customers. To enhance our R&D ability and competitiveness, we also collaborate with National Nano Device Laboratories to commercialize our R&D results and help our customers to develop the advanced plasma clean, PR stripping, Descum and organic removal process, etc. .
The company is a R&D based company, which consist of professional teams of plasma technology, precision machinery,and process integration. We can independently develop semiconductor, packaging and new process technology equipments which including plasma etching, plasma clean and Descum process development. The purpose is to enable our customers not to be limited by foreign expensive equipment & the expense of inferior technology authorization.
At present, our customers mainly rely on imported equipments and technologies, they don’t have the ability to develop their own plasma equipments and not able to provide solutions to their customers who have problems with their process. On the contrary, we have a team with professional background of plasma, material science and electricity & mechanics; a company with core competency of R&D in ICP technologies . In addition to develop the excellent high vacuum ICP plasma equipment of our self-designed machines, we will build relationships with our customers by providing technical service as our management strategies.

We solve the problems that our customers meet in the process of phot-resist removal ,Descum and plasma clean, etc. Even see their needs in the future plasma process of 6 ~8 inches LED and semiconductor. Thus, we can assist customers to develop the top technologies in the world without relying on foreign expensive equipments. Furthermore, making educational training to customers is also a highlight of our strategies. To enhance customer’s understanding of machine and process, we would like to offer training form the basic theories of plasma and material to electricity & mechanics theories

Dernière acitivité fév. 6, 2020
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