AMAT P5000 Mark II

Listing description

APPLIED MATERIALS P5000 PECVD OXIDE DEPOSITION & RIE OXIDE ETCH SYSTEM consisting of:

– Model: P5000
– Software Version E4.26.
– Currently Configured for 6?/150mm Wafers
– 2 Chambers: PECVD Oxide Deposition & RIE Oxide Etch
– ENI OEM-12B RF Generators (Qty 3)
– TEOS Cabinet
– Turbo Pump (for Etch Chamber)
– NT340M Turbotronik Controller
– External Pumps Not Included
– Configured with Following Gases:
– CF4
– CHF3
– Ar
– 02
– He
– SF6
– C4F8
– C2F6

This equipment is located in IE