Aspen 2 ICP Dual Chamber ICP system

Last availability: Oct. 5, 2020

Listing description

Aspen 2 Dual ICP Maker : Mattson
Serial number : 925
Application : Asher / Stripper
Model : Aspen 2 ICP
Vintage : 2001
Wafer Size : 6" or 8" ( Configured as customer's request)
Details Configuration :
1. Cassette platform : SMIF
2. Cool Down Chamber : Installed , New type
3. Slit door : New type
4. Robot Assy. : Standard, New type
5. Cassette door : 18"
6. RF generator : Adtek X 4
7. Heat/Cool Block: Heater , New type with Cicular Groove pattern
8. RF Matching box : Trazar AMU 10D X 4
9. Gas: 3 gases with STEC MFC
10. Gas Box : New type

Please note that this description may have been translated automatically.

Last availability: Oct. 5, 2020

Listing information

Manufacturer Mattson
Model Aspen 2 ICP
Year 2001
Country Taiwan Taiwan
Condition Good
Main category PCB and Semiconductor
Subcategory Other Semi Tools
ID P91021038

Last availability: Oct. 5, 2020

About the seller

Client type Machinery dealer
On Kitmondo since 2013
Number of listings 3
Country Taiwan Taiwan
Employees 11 - 50
Established 9
Company description

The company has been doing in Inductively Coupled Plasma (ICP)technology and used Mattson Aspen 2 system refurbish for several years. Our company has got the advanced plasma technology in the w... read more

The company has been doing in Inductively Coupled Plasma (ICP)technology and used Mattson Aspen 2 system refurbish for several years. Our company has got the advanced plasma technology in the world. We are specialized in semiconductor and LED process technology & equipment. We focus our clients on the fields of LED, Semiconductors (Front end and Back end), Printed circuit boards (PCB), etc, and provide the key technologies to the rapidly developing semiconductor and LED industry. In order to achieve our goal to keep in the lead of advanced plasma technologies and have a sustainable development, we develop new techniques continuously to improve the performance for our customers. To enhance our R&D ability and competitiveness, we also collaborate with National Nano Device Laboratories to commercialize our R&D results and help our customers to develop the advanced plasma clean, PR stripping, Descum and organic removal process, etc. .
The company is a R&D based company, which consist of professional teams of plasma technology, precision machinery,and process integration. We can independently develop semiconductor, packaging and new process technology equipments which including plasma etching, plasma clean and Descum process development. The purpose is to enable our customers not to be limited by foreign expensive equipment & the expense of inferior technology authorization.
At present, our customers mainly rely on imported equipments and technologies, they don’t have the ability to develop their own plasma equipments and not able to provide solutions to their customers who have problems with their process. On the contrary, we have a team with professional background of plasma, material science and electricity & mechanics; a company with core competency of R&D in ICP technologies . In addition to develop the excellent high vacuum ICP plasma equipment of our self-designed machines, we will build relationships with our customers by providing technical service as our management strategies.

We solve the problems that our customers meet in the process of phot-resist removal ,Descum and plasma clean, etc. Even see their needs in the future plasma process of 6 ~8 inches LED and semiconductor. Thus, we can assist customers to develop the top technologies in the world without relying on foreign expensive equipments. Furthermore, making educational training to customers is also a highlight of our strategies. To enhance customer’s understanding of machine and process, we would like to offer training form the basic theories of plasma and material to electricity & mechanics theories

Last activity Feb. 6, 2020
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