DNS Dainippon DNS S

Listing description

Dainippon Screen DNS SU3000

Vintage: 2005
Status: Sitting on a Base in a warehouse in Asia.

Wafer size 300 mm
Number of Chambers 4
Handling Frontside
Number of loadport 3
Number of Chemical Cabinet 3
Overhead Transport System (OHT) Yes

Load port

Manufacture TDK
Model No. TYPE?E3
IR

Manufacture Yasukawa Electric Corp.
Model No. XU-RC350D (Manipulator)
XU-ACT153L (Transfer axis)
FFU

Model No. PCF-18SU3EA
Material Fluoridation resin filter
Capacity of filter 99.999% or more of 0.1?m particle
Range of air control 0~0.4 m/sec
Transfer unit

CR

Manufacture Yasukawa Electric Corp.
Model No. XU-RC615L
FFU

Model No. PCF-43SU3EB
Material Fluoridation resin filter
Capacity of filter 99.999% or more of 0.1?m particle
Range of air control 0~0.6 m/sec
MP chamber

NozzleBB nozzle (shield plate)

nozzle-1 DIW
nozzle-2 N2
Scan nozzle-1

nozzle-1 LAL1400
nozzle-2 HF
nozzle-3 DIW
Scan nozzle-2

nozzle-1(Soft spray type) SC-1
nozzle-2 (soft spray rinse) DIW
nozzle-3 DIW
Backside nozzle

nozzle-1 HF
nozzle-2 SC-1
nozzle-3 DIW
nozzle-4 N2
Spin base

Material PCTFE?SiC
Spin motor AC servo motor
Revolution Max.3000rpm
Acceleration Max. 1000rpm/sec
Revolution accuracy ±3rpm (at 3000rpm)
Chuck

Chuck drive Pulse motor
Material PCTFE
Wafer detection Detection by chuck pins (by photo sensor)
Shield plate

Material HT-PVC
Revolution drive AC servo motor
Revolution Max.3000rpm
Acceleration Max. 1000rpm/sec
Revolution accuracy ±3rpm (at 3000rpm)
Up/down shift AC servo motor
Distance to the wafer surface Min.0.3mm
Splash guard

Structure Chemical collection
Material PTFE
Up/down shift AC servo motor
Shutter

Drive Air cylinder
FFU

Model No. PCF-3SU3FC
Material Fluoridation resin filter
Capacity of filter 99.9999% of 0.1?m particles
Range of air control 0~0.3 m/sec
Ancillary units

Chemical Cabinet 1
Temperature control of low temperature
Chemical used HF(49%)
Chemical mixing ratio HF: H2O = 1:2 or HF
Range of temperature control RT – 50C
Chemical Cabinet 2
Temperature control of low temperature
Chemical used LAL1400
Range of temperature control RT – 50C
Concentration monitor HORIBA CM-210
Chemical Cabinet 3
Temperature control of low temperature
Chemical used NH4OH, H2O2, H2O
Chemical mixing ratio NH4OH:H2O2:H2O = 1:4:20 – 1:1:5
Range of temperature control RT – 50C
Temperature control

Range of temperature control 20~30?
Control accuracy Set temperature ±0.5
Filter

Chemical QCDV ATX TH(Dispo 10inch:Japan Microlis)
0.1?m
DIW STRERAPORE MINI*
0.1?m
N2 WGMXMBSS3(Japan Microlis)
0.01?m
E-FLOW

Module SEPAREL PF-001L
Resistivity Meter OE-960CE
Resistivity Sensor ESD-001C-T
Sensor Cable CK-10M
Sensor Holder EFA-30
Relay MY2N-CR DC24V

This equipment is located in IE