The Karl Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The MJB 3 offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3" in diameter.
M400 Normalfield with revolving objective turret and trinocular microscope head
Leitz NPL 5X, 10X, and 20X objectives
350W High Pressure Mercury (Hg) lamp is currently installed
CH1: 365nm, CH2: 405nm
CIC Power Supply:
CIC 1000 constant intensity controller
THIS MJB 3 CAN ALSO BE ORDERED FOR THE FOLLOWING CONFIGURATIONS:
DUV APPLICATIONS (254nm) IR ALIGNMENT.
PLEASE CONTACT US FOR DETAILS AND PRICING
Includes one (1) set of standard mask holder and matching wafer alignment chuck to customer''s desired wafer size
Sold separately; subject to availability at time of order