Lam Research TCP 9400DFM

Listing description

LAM Research Alliance (A4) TCP 9400DFM

Model: Alliance 4.1 4520XL/9400/XL

Software: A1.1.1-A1-004

Vintage: Feb 26, 1996

Tool was Fully operational until June 29th 2018.

Configuration

Qty 1 – Alliance A4.1 Mainframe
Qty 1 – Alliance 9400DFM Poly Process Module
Qty 1 – Alliance 4520XL Process Module

4520XL was used for Dielectric Etch- such as Oxide, Nitride

9400XL is a Poly Si etch chamber used for etching Poly Si and metals- W- Al- ( No Cu, Au,Ag exposure)

MFC GAS BOX included

MFC channel PM1 PM 2
Lam 9400 (60 C) Lam 4520 (23 C)
1a He 200 CH3F 26
2a Ar 200 C4F8 21
3a CF4 50 CHF3 50
4a Cl2 400 N2 500
5a HBr 500 Ar 1000
6a N/A 0 O2 Lo (B)50
7a O2 Lo 10 O2 Hi 1000
Gas Box 2 Gas Box 2
1b CHF3
50 CO 200
2b SF6 57 CF4 100
3b N2 200 O2Hi(B) 1000
4b CH2F2 100 CF4(B) 100
5b CH3F
100 Cl2 100
6b NF3 105 H2 200
7b O2 Hi
200 O2 Lo (B) 50
Narrow gap ICP CCP

Top: 13.56 MHz 0-1185W Top: 27 MHz 0-2.2kW

Bot: 2 MHz 0-1250W Bot: 2 MHz 0-2525W

Wall Temp 60C Volume: 33000 ml

Top Electrode: 40C Wall Temp Volume: 34000 ml

This equipment is located in IE