Optosystems Ardis 100

Listing description

MW plasma-enchanced CVD diamond system with 2-inch reactor for deposition of high-purity poly-, mono- and nanocrystal diamond films as well as carbon nanotubes from gas mixture (4 channels). Used for diamond AFM probe manufacture (see scdprobes.com), no Boron doping used. Power: up to 6 kW at 2.45 GHz, gas flow: 0,1 to 60 L/h, main mixtures: ?2/??4, ?2/??4/?2, Ar/H2/CH4, doping: N2 (NV color centers). Controlled wafer temperature up to 1200 deg. Deposition speed: up to 6 um/hr. Visual control, water cooling, automated control.

This equipment is located in EE

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Listing information

Manufacturer Optosystems
Model Ardis 100
Year 2011
Country Estonia Estonia
Condition Good
Main category PCB and Semiconductor
Subcategory Semiconductor Equipment
ID P71201003

About the seller

Client type End User
On Kitmondo since 2017
Number of listings 1
Country Estonia Estonia
Last activity Dec. 1, 2017
Contact Click here