Optosystems Ardis 100


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Listing description

MW plasma-enchanced CVD diamond system with 2-inch reactor for deposition of high-purity poly-, mono- and nanocrystal diamond films as well as carbon nanotubes from gas mixture (4 channels). Used for diamond AFM probe manufacture (see scdprobes.com), no Boron doping used. Power: up to 6 kW at 2.45 GHz, gas flow: 0,1 to 60 L/h, main mixtures: ?2/??4, ?2/??4/?2, Ar/H2/CH4, doping: N2 (NV color centers). Controlled wafer temperature up to 1200 deg. Deposition speed: up to 6 um/hr. Visual control, water cooling, automated control.


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Last availability: unknown - check availability

Listing information

Manufacturer Optosystems
Model Ardis 100
Year 2011
Country Estonia Estonia
Condition Good
Main category PCB and Semiconductor
Subcategory Semiconductor Equipment
ID P71201003

Last availability: unknown - check availability

About the seller

Client type End User
On Kitmondo since 2017
Number of listings 1
Country Estonia Estonia
Last activity Dec. 1, 2017
Contact Click here