Semitool Sirius System

Last availability: 64 days ago

Listing description


- Model: Sirius HydrOzone
- Wafer Size: 150mm & 200mm wafer capable
- Process: DI water/ozone
- Rinse: DI water with ammonium hydroxide
- Dry: N2
- Spray processing chamber.
- Uses a minimal amount of deionized water and ozone
- Low cost, low environmental impact process used for photoresist stripping, photolithography rework and organic cleans
- Does not require the use of sulfuric acid with its related delivery and disposal costs
- Year of Manufacture: 2004

Last availability: 64 days ago

Listing information

Manufacturer Semitool
Model Sirius
Year 2004
Country USA USA
Condition Good
Main category PCB and Semiconductor
Subcategory Semiconductor Equipment
ID P90909674

Last availability: 64 days ago

About the seller

Client type Machinery dealer
Active since 2011
Number of listings 70
Country USA USA
Last activity Oct. 21, 2019
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