Description
Model: 600 SemiAuto
- Semi-Automatic RF Plasma System
- Can process up to 200mm wafers
- Used for photoresist stripping and surface cleaning, as well as etching silicon and its compounds
- Chamber Size: 245mm diameter, 380mm depth
- Chamber Material: ceramic
- ENI RF Generator: 0-600 Watt, 13.56 MHz
- Gases: 4 channels controlled by 4 MFCs
- Leybold D65B Vacuum Pump
- Dimensions: 740mm x 624mm x 701mm + connections
- Electrical: 230V, 50/60Hz, 15A, 2kW
- 1731 hours
Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase