LAUREL SPINNER COATER WS-650-23B Price drop

Listing description

Spin coating involves accurately dispensing a liquid, typically photoresist, onto a substrate, typically a semiconductor wafer, then spinning to achieve a uniform, defect-free film. Laurell original, now-famous spin coater design employs the use of extremely precise rotation control coupled with a closed, fully optimized process chamber, leaving absolutely nothing to chance.

The Laurell WS-650-23 B spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).

The 650-series process controller utilizes a robust microprocessor and, with the use of its accompanying PC software (written in an object-oriented programming language), it achieves nearly unheard of flexibility both in process definition and use. This controller allows operator interaction in real-time during the process execution including pausing time, stopping and continuing on from that point. The 650-series controller can also be used in conjunction with a PC with Spin 3000, Laurell's exclusive process management software. However, this is NOT required to program or run the equipment. The use of a PC adds the ability to record a process as it's run, operate remotely, program or communicate across a LAN or the Internet. The software, which is supplied at no additional cost, allows the operator to create virtual process simulations even beyond the hardware actually installed spin processor, in effect, letting them try it before they commit to a process.
All 650 systems can be upgraded or re-purposed without return to the factory with simple plug-in modules, either actually or virtually, and can contain a virtually unlimited number of processes and steps.

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