Semilab CMS3 Sheet Resistance Measuring System

Listing description

FAST NON-CONTACT MATERIAL CHARACTERIZATION AND PROCESS CONTROL

Emitter sheet resistance is a primary quality control parameter for silicon wafers in PV applications after emitter diffusion.

The CLS models, CLS-1A, CLS-3A, and CLS-5A, Emitter Sheet Resistance Testers allow measurement of sheet resistance at 1 to 5 points with the high throughput that meets the requirements of in-line quality control in fully automated cell production lines.

The CMS models, CMS-1A, CMS-3A, Emitter Sheet Resistance Testers allow measurement of wafers i.e. conveyor belt does not stop during measurement. Therefore, they have the high throughput that meets the requirement of in-line quality control in fully automated cell production lines.

Featrues and System specifications:

Meas. technique: non-contact, junction photovoltage (JPV)
Sample size: 100 to 156 mm (210mm option)
Sample structure: np or pn junctions
Measurement range: 10 Î/sq. to 200 I/sq.
Probe distance: 1.5 mm probe height above transport bel
Wafer vertical position tolerance: < 400 μm
Sample support: on belt
Calibration: by wafers verified with four point probe
Options:

Measurement module (incl. 1A-5A sheet resistance measurement heads)
Industrial PC (Windows operation system) and peripherals
CLS-1M emitter checker option
Wafer presence sensor (CMS only)
Wide variety of available interfaces to automation and MES:

24V optically isolated I/O, Ethernet interface
Profibus
OPC DA
TCP/IP protocol, content can be XML or ASCII
SQL database
SECS/GEM

This equipment is located in US