KARL SUSS MJB-3 Mask Aligner

Listing description

KARL SUSS MJB-3 Mask Aligner

Condition: Used

The Karl Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The MJB 3 offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3" in diameter.

Microscope: M400 Normalfield with revolving objective turret and trinocular microscope head

Microscope Objectives: Leitz NPL 5X, 10X, and 20X objectives

Microscope Oculars: 10X eyepieces

Lamphouse: 350W lamphouse

Lamp: 350W High Pressure Mercury (Hg) lamp is currently installed

Exposure Optics: UV400

Optical Sensor: CH1: 365nm, CH2: 405nm

Timer: Digital

CIC Power Supply: CIC 1000 constant intensity controller

NOTE: THIS MJB 3 CAN ALSO BE ORDERED FOR THE FOLLOWING CONFIGURATIONS:
DUV APPLICATIONS (254nm) IR ALIGNMENT. PLEASE CONTACT US FOR DETAILS AND PRICING

Tooling: Includes one (1) set of standard mask holder and matching wafer alignment chuck to customer''s desired wafer size

Vib/Iso Table: Sold separately; subject to availability at time of order
Selling "as is, where is." We do not have the ability to test all equipment. This system was de-installed in working, operational condition.

This equipment is located in US