Seiko SMI3050 FIB-SEM

Listing description

Details:
Seiko SMI3050SE FIB-SEM Dual Beam Microscope consisting of:

- Model: SMI3050SE
- SMI3050SE is an FIB-SEM hybrid system equipped with an ion beam optical system and electron beam optical system developed in response to the shrink of semiconductor devices, enabling high-precision sample processing and observation in comparison to conventional systems.
- Up to 2" sample sizes
- Ga+ focused ion beam column for nanoscale fabrication
- Field Emission SEM for observation during FIB processing
- Image resolution is 4 nm.
- Maimum current density of 30 A/cm2 or greater
- Common applications of this instrument are for nanoscale patterning/fabrication or TEM sample preparation.
- Ion beam can be used to remove regions of a sample or to deposit W metal in specified locations and patterns.
- The material removal process can also be enhanced by the injection of XeF2 or H2O gases.
- Bitmap files or vector scan can be used to create complex patterns and shapes.
- For TEM sample preparation, an attached microprobe is used to pick-up cross-sectional samples in-situ and transfer them to grids.
- Available for full inspection at ClassOne Equipment in Atlanta, Georgia.
- Manufactured in 2006.
- Used minimally at university and in like-new condition!

This equipment is located in US