KLA/TENCOR Candela CS10

Listing description

Offers <0.08 micron particle sensitivity on polished silicon wafers
Exceptional sensitivity to micro scratches for automatic wafer surface inspection, defect detection and classification on 2" - 12" transparent and opaque wafers.
Dual-laser Optical X-Beam technology is well-suited for both laboratory and low volume production applications.
The Candela CS10 Optical Surface Analyzer offers a new approach to unpatterned wafer surface inspection. By combining two laser paths and four independent wafer surface detection techniques, the CS10 Optical Surface Analyzer offers exceptional sensitivity to particles and scratches on optoelectronics and semiconductor wafers.
Using a fast spiral scan motion, the CS10 Optical Surface Analyzer simultaneously measures phase shift, scattered light, reflected light, and topography. The CS10 Optical Surface Analyzer provides data that is represented as high resolution image maps to facilitate visual inspection, or automatically analyzed to detect and classify wafer surface defects.
The compact CS10 Optical Surface Analyzer platform is well-suited for both laboratory and low volume production applications. This optical surface analyzer is easy to learn and operate. This optical surface analyzer is the ideal wafer inspection system for failure analysis and process development applications.
Specifications
Product Category: Wafer and Thin Film Instrumentation. Type & Technology Form Factor Probing System Mounting / Loading Floor Technology Optical / Imaging Applications & Measurements Applications Wafer Measurements Defects, dimples or film residues; Particle contamination Specifications: Wafer / Part Size 51 to 305 mm (2.0 to 12.0 inch) Interfaces & Features Noncontact; Non-destructive

This equipment is located in US