Tepla 600-AL Plasma Asher

Listing description

Model: 600 SemiAuto
- Semi-Automatic RF Plasma System
- Can process up to 200mm wafers
- Used for photoresist stripping and surface cleaning, as well as etching silicon and its compounds
- Chamber Size: 245mm diameter, 380mm depth
- Chamber Material: ceramic
- ENI RF Generator: 0-600 Watt, 13.56 MHz
- Gases: 4 channels controlled by 4 MFCs
- Leybold D65B Vacuum Pump
- Dimensions: 740mm x 624mm x 701mm + connections
- Electrical: 230V, 50/60Hz, 15A, 2kW
- 1731 hours

This equipment is located in US